Lithographic apparatus and device manufacturing method

ABSTRACT

An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.

This application is a continuation of U.S. patent application Ser. No.14/473,795, filed on Aug. 29, 2014, now allowed, which is a continuationof U.S. patent application Ser. No. 13/369,982, filed on Feb. 9, 2012,now U.S. Pat. No. 8,848,165, which is a continuation of U.S. patentapplication Ser. No. 12/314,075, filed on Dec. 3, 2008, now U.S. Pat.No. 8,120,749, which is a continuation of U.S. patent application Ser.No. 11/167,564, filed on Jun. 28, 2005, now U.S. Pat. No. 7,474,379. Theentire contents of each of the foregoing applications is herein fullyincorporated by reference.

FIELD

The present invention relates to a lithographic apparatus and a methodfor manufacturing a device.

BACKGROUND

A lithographic apparatus is a machine that applies a desired patternonto a substrate, usually onto a target portion of the substrate. Alithographic apparatus can be used, for example, in the manufacture ofintegrated circuits (ICs). In that instance, a patterning device, whichis alternatively referred to as a mask or a reticle, may be used togenerate a circuit pattern to be formed on an individual layer of theIC. This pattern can be transferred onto a target portion (e.g.comprising part of, one, or several dies) on a substrate (e.g. a siliconwafer). Transfer of the pattern is typically via imaging onto a layer ofradiation-sensitive material (resist) provided on the substrate. Ingeneral, a single substrate will contain a network of adjacent targetportions that are successively patterned. Known lithographic apparatusinclude so-called steppers, in which each target portion is irradiatedby exposing an entire pattern onto the target portion at one time, andso-called scanners, in which each target portion is irradiated byscanning the pattern through a radiation beam in a given direction (the“scanning”-direction) while synchronously scanning the substrateparallel or anti-parallel to this direction. It is also possible totransfer the pattern from the patterning device to the substrate byimprinting the pattern onto the substrate.

It has been proposed to immerse the substrate in the lithographicprojection apparatus in a liquid having a relatively high refractiveindex, e.g. water, so as to fill a space between the final element ofthe projection system and the substrate. The point of this is to enableimaging of smaller features since the exposure radiation will have ashorter wavelength in the liquid. (The effect of the liquid may also beregarded as increasing the effective NA of the system and alsoincreasing the depth of focus.) Other immersion liquids have beenproposed, including water with solid particles (e.g. quartz) suspendedtherein.

However, submersing the substrate or substrate and substrate table in abath of liquid (see, for example, U.S. Pat. No. 4,509,852, herebyincorporated in its entirety by reference) means that there is a largebody of liquid that must be accelerated during a scanning exposure. Thisrequires additional or more powerful motors and turbulence in the liquidmay lead to undesirable and unpredictable effects.

One of the solutions proposed is for a liquid supply system to provideliquid on only a localized area of the substrate (i.e. the space inwhich immersion liquid is present is smaller in plan than the substrate)and in between the final element of the projection system and thesubstrate using a liquid confinement system (the substrate generally hasa larger surface area than the final element of the projection system).One way which has been proposed to arrange for this is disclosed in PCTpatent application publication WO 99/49504, hereby incorporated in itsentirety by reference. As illustrated in FIGS. 2 and 3, liquid issupplied by at least one inlet IN onto the substrate, preferably alongthe direction of movement of the substrate relative to the finalelement, and is removed by at least one outlet OUT after having passedunder the projection system. That is, as the substrate is scannedbeneath the element in a −X direction, liquid is supplied at the +X sideof the element and taken up at the −X side. FIG. 2 shows the arrangementschematically in which liquid is supplied via inlet IN and is taken upon the other side of the element by outlet OUT which is connected to alow pressure source. In the illustration of FIG. 2 the liquid issupplied along the direction of movement of the substrate relative tothe final element, though this does not need to be the case. Variousorientations and numbers of in- and out-lets positioned around the finalelement are possible, one example is illustrated in FIG. 3 in which foursets of an inlet with an outlet on either side are provided in a regularpattern around the final element.

In an immersion lithographic apparatus, bubbles in the immersion liquidmay deleteriously affect the image quality produced by the apparatus. Inaddition or alternatively, temperature gradients in the immersion liquidmay cause imaging defects because of the temperature dependency of therefractive index of the immersion liquid. Temperature gradients canarise because of absorption of the projection beam by the immersionliquid and because of heat transfer from other parts of the apparatus,such as the substrate or the liquid confinement system. Additionally oralternatively, the transportation of contaminants from the resist and/ortop coat to the final element of the projection system by the immersionliquid may deleteriously affect image quality.

SUMMARY

It is desirable to provide an immersion lithography apparatus in whichtemperature gradients in the immersion liquid and the transportation ofcontaminants by the immersion liquid can be avoided and in which thechance of the image being deleteriously affected by bubbles in theimmersion liquid during exposure is minimized or reduced.

According to an aspect of the present invention, there is provided alithographic projection apparatus arranged to project a pattern from apatterning device onto a substrate through a liquid confined to a spaceadjacent the substrate, the apparatus comprising a first platesubstantially parallel to the substrate to divide the space into twoparts, the first plate having an aperture to allow transmission of thepattern onto the substrate and having a plurality of through holes toallow fluid communication between liquid above the plate and liquidbelow the plate through the through holes.

According to an aspect of the present invention, there is provided alithographic projection apparatus arranged to project a pattern from apatterning device onto a substrate through a liquid confined in a spaceadjacent the substrate, the apparatus comprising a structuresubstantially parallel to the substrate to divide the space into twoparts, the structure having an aperture to allow transmission of thepattern, an inlet to provide liquid to the space, and an outlet toremove liquid from the space.

According to an aspect of the present invention, there is provided alithographic projection apparatus arranged to project a pattern from apatterning device onto a substrate through a liquid confined in a spaceadjacent the substrate, the apparatus comprising a structuresubstantially parallel to the substrate to divide the space into twoparts, the structure having an aperture to allow transmission of thepattern and comprising three plates with an inlet, an outlet, or both,positioned between the plates.

According to an aspect of the present invention, there is provided alithographic projection apparatus arranged to project a pattern from apatterning device onto a substrate through a liquid confined in a spaceadjacent the substrate, the apparatus comprising a structuresubstantially parallel to the substrate to divide the space into twoparts, the structure having an aperture to allow transmission of thepattern and an inlet to provide liquid to the space, an outlet to removeliquid from the space, or both, the inlet, the outlet, or both, directedtowards the substrate.

According to an aspect of the present invention, there is provided adevice manufacturing method comprising projecting a patterned beam ofradiation, through an aperture and a liquid provided in a space adjacenta substrate, onto the substrate, wherein a first plate substantiallyparallel to the substrate divides the space into two parts, the firstplate having the aperture and a plurality of through holes to allowfluid communication between liquid above the plate and liquid below theplate through the through holes.

According to an aspect of the present invention, there is provided adevice manufacturing method comprising projecting a patterned beam ofradiation, through an aperture and a liquid provided in a space adjacenta substrate, onto the substrate, wherein a structure substantiallyparallel to the substrate divides the space into two parts, thestructure having the aperture, an inlet to provide liquid to the space,and an outlet to remove liquid from the space.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the invention will now be described, by way of exampleonly, with reference to the accompanying schematic drawings in whichcorresponding reference symbols indicate corresponding parts, and inwhich:

FIG. 1 depicts a lithographic apparatus according to an embodiment ofthe invention;

FIGS. 2 and 3 depict a liquid supply system for use in a lithographicprojection apparatus;

FIG. 4 depicts a further liquid supply system for use in a lithographicprojection apparatus;

FIG. 5 depicts another liquid supply system for use in a lithographicprojection apparatus;

FIG. 6 depicts in section a liquid supply system according to anembodiment of the invention;

FIG. 7 depicts in plan the liquid supply system of FIG. 6; and

FIGS. 8-15 depict possible arrangements in embodiments of the invention.

DETAILED DESCRIPTION

FIG. 1 schematically depicts a lithographic apparatus according to oneembodiment of the invention. The apparatus comprises:

-   -   an illumination system (illuminator) IL configured to condition        a radiation beam B (e.g. UV radiation or DUV radiation).    -   a support structure (e.g. a mask table) MT constructed to        support a patterning device (e.g. a mask) MA and connected to a        first positioner PM configured to accurately position the        patterning device in accordance with certain parameters;    -   a substrate table (e.g. a wafer table) WT constructed to hold a        substrate (e.g. a resist-coated wafer) W and connected to a        second positioner PW configured to accurately position the        substrate in accordance with certain parameters; and    -   a projection system (e.g. a refractive projection lens system)        PL configured to project a pattern imparted to the radiation        beam by patterning device MA onto a target portion C (e.g.        comprising one or more dies) of the substrate W.

The illumination system may include various types of optical components,such as refractive, reflective, magnetic, electromagnetic, electrostaticor other types of optical components, or any combination thereof, fordirecting, shaping, or controlling radiation.

The support structure holds the patterning device in a manner thatdepends on the orientation of the patterning device, the design of thelithographic apparatus, and other conditions, such as for examplewhether or not the patterning device is held in a vacuum environment.The support structure can use mechanical, vacuum, electrostatic or otherclamping techniques to hold the patterning device. The support structuremay be a frame or a table, for example, which may be fixed or movable asrequired. The support structure may ensure that the patterning device isat a desired position, for example with respect to the projectionsystem. Any use of the terms “reticle” or “mask” herein may beconsidered synonymous with the more general term “patterning device.”

The term “patterning device” used herein should be broadly interpretedas referring to any device that can be used to impart a radiation beamwith a pattern in its cross-section such as to create a pattern in atarget portion of the substrate. It should be noted that the patternimparted to the radiation beam may not exactly correspond to the desiredpattern in the target portion of the substrate, for example if thepattern includes phase-shifting features or so called assist features.Generally, the pattern imparted to the radiation beam will correspond toa particular functional layer in a device being created in the targetportion, such as an integrated circuit.

The patterning device may be transmissive or reflective. Examples ofpatterning devices include masks, programmable mirror arrays, andprogrammable LCD panels. Masks are well known in lithography, andinclude mask types such as binary, alternating phase-shift, andattenuated phase-shift, as well as various hybrid mask types. An exampleof a programmable mirror array employs a matrix arrangement of smallmirrors, each of which can be individually tilted so as to reflect anincoming radiation beam in different directions. The tilted mirrorsimpart a pattern in a radiation beam which is reflected by the mirrormatrix.

The term “projection system” used herein should be broadly interpretedas encompassing any type of projection system, including refractive,reflective, catadioptric, magnetic, electromagnetic and electrostaticoptical systems, or any combination thereof, as appropriate for theexposure radiation being used, or for other factors such as the use ofan immersion liquid or the use of a vacuum. Any use of the term“projection lens” herein may be considered as synonymous with the moregeneral term “projection system”.

As here depicted, the apparatus is of a transmissive type (e.g.employing a transmissive mask). Alternatively, the apparatus may be of areflective type (e.g. employing a programmable mirror array of a type asreferred to above, or employing a reflective mask).

The lithographic apparatus may be of a type having two (dual stage) ormore substrate tables (and/or two or more mask tables). In such“multiple stage” machines the additional tables may be used in parallel,or preparatory steps may be carried out on one or more tables while oneor more other tables are being used for exposure.

Referring to FIG. 1, the illuminator IL receives a radiation beam from aradiation source SO. The source and the lithographic apparatus may beseparate entities, for example when the source is an excimer laser. Insuch cases, the source is not considered to form part of thelithographic apparatus and the radiation beam is passed from the sourceSO to the illuminator IL with the aid of a beam delivery system BDcomprising, for example, suitable directing mirrors and/or a beamexpander. In other cases the source may be an integral part of thelithographic apparatus, for example when the source is a mercury lamp.The source SO and the illuminator IL, together with the beam deliverysystem BD if required, may be referred to as a radiation system.

The illuminator IL may comprise an adjuster AM for adjusting the angularintensity distribution of the radiation beam. Generally, at least theouter and/or inner radial extent (commonly referred to as σ-outer andσ-inner, respectively) of the intensity distribution in a pupil plane ofthe illuminator can be adjusted. In addition, the illuminator IL maycomprise various other components, such as an integrator IN and acondenser CO. The illuminator may be used to condition the radiationbeam, to have a desired uniformity and intensity distribution in itscross-section.

The radiation beam is incident on the patterning device (e.g., mask MA),which is held on the support structure (e.g., mask table MT), and ispatterned by the patterning device. Having traversed the mask MA, theradiation beam passes through the projection system PL, which focusesthe beam onto a target portion C of the substrate W. With the aid of thesecond positioner PW and position sensor IF (e.g. an interferometricdevice, linear encoder or capacitive sensor), the substrate table WT canbe moved accurately, e.g. so as to position different target portions Cin the path of the radiation beam. Similarly, the first positioner PMand another position sensor (which is not explicitly depicted in FIG. 1)can be used to accurately position the mask MA with respect to the pathof the radiation beam, e.g. after mechanical retrieval from a masklibrary, or during a scan. In general, movement of the mask table MT maybe realized with the aid of a long-stroke module (coarse positioning)and a short-stroke module (fine positioning), which form part of thefirst positioner PM. Similarly, movement of the substrate table WT maybe realized using a long-stroke module and a short-stroke module, whichform part of the second positioner PW. In the case of a stepper (asopposed to a scanner) the mask table MT may be connected to ashort-stroke actuator only, or may be fixed. Mask MA and substrate W maybe aligned using mask alignment marks M1, M2 and substrate alignmentmarks P1, P2. Although the substrate alignment marks as illustratedoccupy dedicated target portions, they may be located in spaces betweentarget portions (these are known as scribe-lane alignment marks).Similarly, in situations in which more than one die is provided on themask MA, the mask alignment marks may be located between the dies.

The depicted apparatus could be used in at least one of the followingmodes:

1. In step mode, the mask table MT and the substrate table WT are keptessentially stationary, while an entire pattern imparted to theradiation beam is projected onto a target portion C at one time (i.e. asingle static exposure). The substrate table WT is then shifted in the Xand/or Y direction so that a different target portion C can be exposed.In step mode, the maximum size of the exposure field limits the size ofthe target portion C imaged in a single static exposure.

2. In scan mode, the mask table MT and the substrate table WT arescanned synchronously while a pattern imparted to the radiation beam isprojected onto a target portion C (i.e. a single dynamic exposure). Thevelocity and direction of the substrate table WT relative to the masktable MT may be determined by the (de-)magnification and image reversalcharacteristics of the projection system PS. In scan mode, the maximumsize of the exposure field limits the width (in the non-scanningdirection) of the target portion in a single dynamic exposure, whereasthe length of the scanning motion determines the height (in the scanningdirection) of the target portion.

3. In another mode, the mask table MT is kept essentially stationaryholding a programmable patterning device, and the substrate table WT ismoved or scanned while a pattern imparted to the radiation beam isprojected onto a target portion C. In this mode, generally a pulsedradiation source is employed and the programmable patterning device isupdated as required after each movement of the substrate table WT or inbetween successive radiation pulses during a scan. This mode ofoperation can be readily applied to maskless lithography that utilizesprogrammable patterning device, such as a programmable mirror array of atype as referred to above.

Combinations and/or variations on the above described modes of use orentirely different modes of use may also be employed.

A further immersion lithography solution with a localized liquid supplysystem is shown in FIG. 4. Liquid is supplied by two groove inlets IN oneither side of the projection system PL and is removed by a plurality ofdiscrete outlets OUT arranged radially outwardly of the inlets IN. Theinlets IN and OUT can be arranged in a plate with a hole in its centerand through which the projection beam is projected. Liquid is suppliedby one groove inlet IN on one side of the projection system PL andremoved by a plurality of discrete outlets OUT on the other side of theprojection system PL, causing a flow of a thin film of liquid betweenthe projection system PL and the substrate W. The choice of whichcombination of inlet IN and outlets OUT to use can depend on thedirection of movement of the substrate W (the other combination of inletIN and outlets OUT being inactive).

Another immersion lithography solution with a localized liquid supplysystem solution which has been proposed is to provide the liquid supplysystem with a liquid confinement structure which extends along at leasta part of a boundary of the space between the final element of theprojection system and the substrate table. Such a solution isillustrated in FIG. 5. The liquid confinement structure is substantiallystationary relative to the projection system in the XY plane thoughthere may be some relative movement in the Z direction (in the directionof the optical axis). In an embodiment, a seal is formed between theliquid confinement structure and the surface of the substrate. In anembodiment, the seal is a contactless seal such as a gas seal. Such asystem is disclosed in United States patent application publication no.US 2004-0207824 and European patent application publication no. EP1420298, each hereby incorporated in its entirety by reference, andillustrated in FIG. 5.

As can be seen in FIG. 5, a reservoir 10 forms a contactless seal to thesubstrate around the image field of the projection system so that liquidis confined to fill a space between the substrate surface and the finalelement of the projection system. The reservoir is formed by a liquidconfinement structure 12 positioned below and surrounding the finalelement of the projection system PL. Liquid is brought into the spacebelow the projection system and within the liquid confinement structure12. The liquid confinement structure 12 extends a little above the finalelement of the projection system and the liquid level rises above thefinal element so that a buffer of liquid is provided. The liquidconfinement structure 12 has an inner periphery that at the upper endpreferably closely conforms to the shape of the projection system or thefinal element thereof and may, e.g., be round. At the bottom, the innerperiphery closely conforms to the shape of the image field, e.g.,rectangular though this need not be the case.

The liquid is confined in the reservoir by a gas seal 16 between thebottom of the liquid confinement structure 12 and the surface of thesubstrate W. The gas seal is formed by gas, e.g. air, synthetic air, N₂or an inert gas, provided under pressure via inlet 15 to the gap betweenliquid confinement structure 12 and substrate and extracted via outlet14. The overpressure on the gas inlet 15, vacuum level on the outlet 14and geometry of the gap are arranged so that there is a high-velocitygas flow inwards that confines the liquid.

In European patent application publication no. EP 1420300 and UnitedStates patent application publication no. US 2004-0136494, each herebyincorporated in their entirety by reference, the idea of a twin or dualstage immersion lithography apparatus is disclosed. Such an apparatus isprovided with two tables for supporting a substrate. Levelingmeasurements are carried out with a table at a first position, withoutimmersion liquid, and exposure is carried out with a table at a secondposition, where immersion liquid is present. Alternatively, theapparatus has only one table.

U.S. patent application Ser. No. 10/986,187, filed Nov. 12, 2004, whichis incorporated herein in its entirety, discloses a system similar tothat illustrated in FIGS. 6 and 7 for the supply of liquid in animmersion lithography apparatus.

FIGS. 6 and 7 show an immersion hood 20 (which may also be referred toas a liquid supply or confinement system) according to a particularembodiment of the invention. The immersion hood comprises a liquidconfinement structure 21 which confines immersion liquid 11 to a spacebetween the final element of the projection system PL and the substrateW. The liquid confinement structure 21 is borne above the substrate inU.S. patent application Ser. No. 10/986,187 about 30 to 300 μm (but maybe more or less) and has a seal device 22 to restrict outflow of theimmersion liquid 11. This may be a gas or liquid seal, using a flow ofgas or liquid to confine the liquid 11, and may also act as a bearingfor the liquid confinement structure which alternatively may beseparately supported and/or actuated. The seal device 22 may simply be alow pressure extraction port to suck away liquid (and in the illustratedembodiment gas as well) flowing under the liquid confinement structure21. A gas knife 23 may be provided to drive any residual film of liquidback towards seal and extraction device 22. The arrangement of theliquid confinement structure 21 may be as illustrated in U.S. patentapplication Ser. No. 11/098,615, filed 5 Apr. 2005, in particularregarding the bottom side of the liquid confinement structure 21 inwhich a single phase extractor is used and a recess 26 is positionedbetween the extractor and the gas knife and a mixture of gas and liquidis extracted through the recess.

To prevent or reduce transportation of contaminants from the resistand/or topcoat on the substrate and temperature gradients in theimmersion liquid, e.g. ultra pure water, a plate 24 is provided todivide the space between the projection system PL and substrate W intotwo parts. The plate 24 has an aperture or window 24 a to allowtransmission of the projection beam PB, the aperture or window beingslightly larger than the exposure field EF to accommodate theconvergence of the projection beam from the projection system to thesubstrate.

In an embodiment of the invention, the plate 24 has an aperture 24 a andthe overall liquid supply 25 is arranged above the plate 24. Thiscombined with the extraction of liquid by seal device 22 ensures asubstantially constant flow of liquid from the part of the spaceadjacent the projection system to the part adjacent the substrate whichensures contaminants and liquid that has been heated or cooled by thesubstrate are quickly removed from the system. The space above the platein FIG. 6 may be kept at a higher pressure than that below to ensure asuitable flow rate. Additional liquid extraction may be performed abovethe plate to ensure adequate refreshment of the liquid 11. Similarly,additional liquid supply below the plate may be provided as desired.

In an embodiment of the invention, the aperture may be closed by atransparent plate to form a window. The window should have a hightransmissivity at the wavelength of the projection system and, in anembodiment, a refractive index as close as possible to that of theimmersion liquid. The window should be sufficiently flat and planeparallel to enable desired imaging requirements to be met. In such anembodiment, liquid supply and extraction ports are provided on bothsides of the plate 24.

In an embodiment of the invention, the plate 24 should be made of amaterial having sufficient mechanical strength and desirably a lowthermal conductivity. Suitable materials include: steel, stainlesssteel, ceramic, glass and quartz, as well as low GTE materials such asZerodur™, ULE™, and Invar™. The plate need not be attached to the liquidconfinement structure 21 but may also be separately supported.

An advantage of the plate 24 is that it blocks stray light which mayreduce the contrast in the projected image and to enhance this effect,an absorptive coating may be provided on the plate. A hydrophobic and/orhydrophilic coating may be provided, in addition or alternatively, tocontrol the liquid flow and a different coating may be used on each sideof the plate. Especially if the plate 24 is thick, the edge of theaperture 24 a may be beveled to allow the aperture to more closelyconform to the shape of the projection beam. If desired multiple platesmay be used to divide the space into more than two parts.

In an embodiment, the plate 24 is positioned as close as possible to thesubstrate but for safety should be sufficiently far away to avoidcontact with the substrate, even in exceptional circumstances.

One or more embodiments of the present invention disclosed herein isdirected to improvements to the subject matter disclosed in U.S. patentapplication Ser. No. 10/986,187, in particular steps are taken to reduceor minimize the deleterious effect of bubbles in the space with theimmersion liquid 11 affecting imaging of the substrate and to reduce orminimize the damping effect which can occur due to the presence of theplate 24 during movement, particular in the Z-axis, of the substrate Wrelative to the projection system PL. The measures employed to addressthis issue are illustrated in the arrangement of plate 24 in FIG. 8.

In FIG. 8, it can clearly be seen that the plate 24 has a plurality ofthrough holes 50 extending in the vertical axis or substantiallyparallel to the optical axis of the projection system. These throughholes 50 are shaped such that they promote flow of immersion liquidthrough the holes on a relative movement of the plate 24 to theimmersion liquid in the vertical direction but that the immersion liquiddoes not tend to pass through the through holes 50 if the immersionliquid is moving horizontally past the plate. In this way the functionof the plate 24 to separate the space of the immersion liquid 11 intotwo parts is maintained whilst if the liquid supply system or theprojection system needs to move closer to the substrate the effect ofthe plate 24 in damping the motion due to interaction with the immersionliquid 11 is reduced. Thus it can be seen that the through holes 50allow an impulse from the immersion liquid 11 underneath the plate 24 tobe transferred to liquid above the plate 24. This is because the holesallow fluid communication between liquid above and liquid below theplate 24. A little flow of immersion liquid through the through holes 50may also occur but as the relative movement of the substrate, liquidconfinement structure 21 and projection system PL is small (of the orderof several microns), not much flow occurs. The through holes 50 aretypically about 40 μm in diameter but may be up to 2 mm in diameter. Thedamper area (i.e. sum of the areas of the through holes) is theimportant factor. For 40 μm diameter holes, a pitch of about 3.5 mm isabout right. This covers about 5 to 10% of the area.

Also illustrated in FIG. 8 is a first flow channel 80 through whichimmersion liquid can be provided via an outlet 81 into the space of theimmersion liquid 11. A corresponding second flow channel 90 on the otherside of the aperture 30 starts at an inlet 91 so that immersion liquidcan be removed from the space. In particular in FIG. 8, flow ofimmersion liquid through the flow channels in the plate 24 is arrangedsuch that it is across the aperture 30 from one side to the other. In anembodiment, the through flow is arranged to be as close as possible tolaminar to avoid recirculation of immersion liquid. Arranging for such aflow across the aperture has the effect of reducing the presence ofbubbles in the aperture; bubbles tend to be produced at the interfacebetween the immersion liquid and the substrate W during relativemovement of the immersion liquid and the substrate W, for example,during scanning of the substrate. By providing a substantially constantflow of immersion liquid across the aperture 30, the migration of thebubbles to the aperture produced by the scanning motion below the plate24 may be minimized.

If the size of the through holes 50 is small, this can lead todifficulties in filling of the liquid confinement structure 21 withimmersion liquid, particularly with gas entrapment. One solution is toincrease the through hole 50 size such that bubbles do not get trappedunderneath the plate 24 during filling. Another solution is to providean under pressure (about −40 mbar is suitable for 40 μm diameter throughholes) to the flow channels 80, 90 after filling of the liquidconfinement structure 21 with immersion liquid to extract bubblestrapped under the plate 24 through the flow channels 80, 90.

The embodiment illustrated in FIG. 8 has been described above ascomprising a single plate 24. However, it will be appreciated that theembodiment could equally well be described as being formed of two ormore plates with a flow channel between a first upper plate and a secondlower plate. Typically the two or more plates might be of 0.1 mmthickness with a gap between them of 0.3 mm. In this present embodiment,the distance between the final element of the projection system PL andthe substrate W is arranged to be of the order of 1 to 5 mm which islarger than that described in U.S. patent application Ser. No.10/986,187. This is arranged for so that during exchange of onesubstrate for another it is possible to move the liquid supply system uptowards the projection system PL and this negates the need to move thesubstrate table WT down away from the projection system PL duringsubstrate swap.

Therefore it can be seen that the plate 24 has an immersion liquid inletand a immersion liquid outlet.

The embodiments of FIGS. 9-15 are not illustrated with through holes inthe one or more plates. Any of the embodiments may incorporate suchthrough holes if desired and they are only not illustrated in thefigures for clarity purposes. Indeed, the embodiment of FIG. 8 may alsowork well without the presence of through holes 50.

A further embodiment in which a structure which is substantiallyparallel to the substrate and which divides the space into two parts isprovided comprises two plates namely an upper plate 120 and a lowerplate 130 as illustrated in FIG. 9. The aperture in the lower plate 130is created to be larger than that in the upper plate 120. The upperplate 120 has a smaller aperture and has at its radially inwardly end adownwardly extending portion 122 (to direct flow downwards) which formsside walls 124 a of the aperture 30 before extending radially inwardlyagain to form a lip 140 which forms the narrowest part of the aperture30. By positioning the upper plate 120 over the lower plate 130 andarranging for the gap between the two plates to form a flow channel 180,an outlet 181 which extends in a peripheral loop around the aperture 30is produced and which is directed downwards towards the substrate W.This arrangement may be particularly effective at clearing the pathwaythrough the immersion liquid of the patterned projection beam PB ofbubbles which are formed at the interface between the immersion liquidand the substrate and the environment. The flow of liquid indicated byarrows in FIG. 9 helps to ensure that liquid comprising bubbles is movedout of the center of the space of the immersion liquid 11. Liquid isprovided above the upper plate 120 and flows downwards through theaperture 30. This liquid which is provided to the space from above theupper plate 120 is generally freer of bubbles than liquid below thelower plate 130 so that this arrangement has the effect of providing aclear path for the patterned beam through the immersion liquid withoutobstruction by bubbles.

The effect of the lip 140 is that it accelerates immersion liquidpassing through the aperture from above thereby making the flow morehomogeneous.

The embodiment illustrated in FIG. 10 is similar to that illustrated inFIG. 8 except that the plate 224 is not arranged to have a liquidoutlet, rather a peripheral liquid inlet 281 is provided around theinner periphery 224 a of the aperture 30. The arrows in FIG. 10illustrate the flow of immersion liquid.

FIG. 11 illustrates a further embodiment in which a third plate is addedto the structure which divides the space. In this case an upper plate310 is provided which is separated from a middle plate 320 which is inturn separated from a lower plate 330. Thus the upper and lower plates310, 330 sandwich the middle plate 320. Flow channels are providedbetween the upper plate 310 and the middle plate 320 and between themiddle plate 320 and the lower plate 330. Any arrangement of inlets andoutlets may be used so long as at least one inlet is present and atleast one outlet is present. In the illustrated embodiment it is shownthat the flow channels 315, 380 end in inlets 381 and the flow channels325, 390 between the middle and lower plates end in outlets 391.However, it is possible for the left hand side flow channels to end inoutlets and the right hand side channels to end in inlets so thatsubstantially parallel flow across the aperture 30 is provided. Otherarrangements will be clear to the skilled person.

The embodiment of FIG. 12 is similar to that of FIG. 9 except that thestructure which divides the space has had a further top plate 410 added.A further flow channel 415 is formed between the top plate 410 and themiddle plate 420 which is the top plate 120 in FIG. 9. Liquid isprovided through inlet(s) 481 which is in fluid communication with theflow channel 415 to the aperture 30 and, contrary to what is illustratedin FIG. 9, the flow channel 480 between the middle 420 and lower 430plates comprises inlet(s) 491 so that a flow of immersion liquid intothe aperture 30 around the bottom of the lip 440 and into the inlet(s)491 is provided. This circular flow of liquid in the aperture 30 may beparticularly good at keeping bubbles from migrating from the remainderof the space of the immersion liquid 11 into the aperture 30.

A further embodiment is illustrated in FIG. 13. In this embodiment a topplate 520 is provided which has a downwardly extending wall 522 whichextends such that the lower lip 540 extends below the bottom surface ofa middle plate 510 and bottom plate 530. The middle plate 510 also has adownwardly extending portion 511 and is terminated by a T-portion 512which extends lips on either side of the downwardly extending portion511. Again flow channels are formed between the top plate 520 and themiddle plate 510 and between the middle plate 510 and the bottom plate530. In the illustrated embodiment the flow channel 580 between the top520 and middle 510 plates ends in an outlet and the other channel 590between the middle 510 and bottom 530 plates ends in an inlet such thatthe outlet is positioned radially inwardly relative to the inlet.However, this situation may be reversed and indeed it may be arrangedthat the flow channels on the left hand side end in outlets and those onthe right hand side start as inlets so that a flow of immersion liquidacross the bottom of the aperture 30 is provided. Indeed, the embodimentin FIG. 14, which is otherwise the same as that of FIG. 13 has theposition of the inlet and outlets reversed and this may be effective insucking out bubbles from the remainder of the space below the bottomplate. For this purpose it may be advantageous to have the top plateextending below the bottom surface of the bottom plate 430 as isillustrated.

The embodiment illustrated in FIG. 15 is the same as that of FIG. 9except that the outlet 181 is now formed as an inlet. This embodimentmay be particularly good at extracting bubbles from the immersion liquidtrapped beneath the bottom plate 130.

In an embodiment, there is provided a lithographic projection apparatusarranged to project a pattern from a patterning device onto a substratethrough a liquid confined to a space adjacent the substrate, theapparatus comprising a first plate substantially parallel to thesubstrate to divide the space into two parts, the first plate having anaperture to allow transmission of the pattern onto the substrate andhaving a plurality of through holes to allow fluid communication betweenliquid above the plate and liquid below the plate through the throughholes.

In an embodiment, the through holes are shaped and/or distributed and/ordimensioned for the transfer of an impulse from liquid below the plateto liquid above the plate. In an embodiment, the apparatus furthercomprises a second plate in the space and substantially parallel to thefirst plate. In an embodiment, the second plate has a plurality ofthrough holes to allow the flow of liquid therethrough. In anembodiment, a flow channel substantially parallel to the substrate toallow flow of liquid exists in or adjacent the first plate. In anembodiment, the flow channel is arranged to create a flow of liquid inand adjacent the aperture to substantially prevent bubbles in liquid inanother area of the space from migrating into the aperture, to removebubbles trapped underneath the plate, or both. In an embodiment, theanother area of the space is an area between the first plate, the secondplate, or both, and the substrate. In an embodiment, the flow channelhas an outlet into the space configured to direct liquid in a directionnot parallel to the substrate. In an embodiment, the apparatus furthercomprises a low pressure source configured to apply an under pressure tothe flow channel to substantially remove bubbles in the liquid under theplate through the through holes. In an embodiment, the apparatuscomprises a third plate in the space that is substantially parallel tothe first and second plates.

In an embodiment, there is provided a lithographic projection apparatusarranged to project a pattern from a patterning device onto a substratethrough a liquid confined in a space adjacent the substrate, theapparatus comprising a structure substantially parallel to the substrateto divide the space into two parts, the structure having an aperture toallow transmission of the pattern, an inlet to provide liquid to thespace, and an outlet to remove liquid from the space.

In an embodiment, the inlet and outlet are arranged to promote liquidflow across the aperture. In an embodiment, the inlet forms a closedloop around the aperture, the outlet forms a closed loop around theaperture, or both. In an embodiment, the inlet is radially inward of theoutlet. In an embodiment, the inlet is radially outward of the outlet.In an embodiment, the inlet is positioned further from the substratethan the outlet. In an embodiment, the inlet, the outlet, or both, isdirected towards the substrate. In an embodiment, the structurecomprises a lip which forms the narrowest part of the aperture, theremainder of the aperture being wider.

In an embodiment, there is provided a lithographic projection apparatusarranged to project a pattern from a patterning device onto a substratethrough a liquid confined in a space adjacent the substrate, theapparatus comprising a structure substantially parallel to the substrateto divide the space into two parts, the structure having an aperture toallow transmission of the pattern and comprising three plates with aninlet, an outlet, or both, positioned between the plates.

In an embodiment, the inlet, the outlet, or both, are arranged topromote liquid flow across the aperture. In an embodiment, the inletforms a closed loop around the aperture, the outlet forms a closed looparound the aperture, or both. In an embodiment, the inlet, the outlet,or both, is directed towards the substrate. In an embodiment, thestructure comprises a lip which forms the narrowest part of theaperture, the remainder of the aperture being wider.

In an embodiment, there is provided a lithographic projection apparatusarranged to project a pattern from a patterning device onto a substratethrough a liquid confined in a space adjacent the substrate, theapparatus comprising a structure substantially parallel to the substrateto divide the space into two parts, the structure having an aperture toallow transmission of the pattern and an inlet to provide liquid to thespace, an outlet to remove liquid from the space, or both, the inlet,the outlet, or both, directed towards the substrate.

In an embodiment, the structure comprises a lip which forms thenarrowest part of the aperture, the remainder of the aperture beingwider.

In an embodiment, there is provided a device manufacturing methodcomprising projecting a patterned beam of radiation, through an apertureand a liquid provided in a space adjacent a substrate, onto thesubstrate, wherein a first plate substantially parallel to the substratedivides the space into two parts, the first plate having the apertureand a plurality of through holes to allow fluid communication betweenliquid above the plate and liquid below the plate through the throughholes. In an embodiment, a second plate is substantially parallel to thefirst plate in the space.

In an embodiment, there is provided a device manufacturing methodcomprising projecting a patterned beam of radiation, through an apertureand a liquid provided in a space adjacent a substrate, onto thesubstrate, wherein a structure substantially parallel to the substratedivides the space into two parts, the structure having the aperture, aninlet to provide liquid to the space, and an outlet to remove liquidfrom the space.

Although specific reference may be made in this text to the use oflithographic apparatus in the manufacture of ICs, it should beunderstood that the lithographic apparatus described herein may haveother applications, such as the manufacture of integrated opticalsystems, guidance and detection patterns for magnetic domain memories,flat-panel displays, liquid-crystal displays (LCDs), thin-film magneticheads, etc. The skilled artisan will appreciate that, in the context ofsuch alternative applications, any use of the terms “wafer” or “die”herein may be considered as synonymous with the more general terms“substrate” or “target portion”, respectively. The substrate referred toherein may be processed, before or after exposure, in for example atrack (a tool that typically applies a layer of resist to a substrateand develops the exposed resist), a metrology tool and/or an inspectiontool. Where applicable, the disclosure herein may be applied to such andother substrate processing tools. Further, the substrate may beprocessed more than once, for example in order to create a multi-layerIC, so that the term substrate used herein may also refer to a substratethat already contains multiple processed layers.

The terms “radiation” and “beam” used herein encompass all types ofelectromagnetic radiation, including ultraviolet (UV) radiation (e.g.having a wavelength of or about 365, 248, 193, 157 or 126 nm).

The term “lens”, where the context allows, may refer to any one orcombination of various types of optical components, including refractiveand reflective optical components.

While specific embodiments of the invention have been described above,it will be appreciated that the invention may be practiced otherwisethan as described. For example, the invention may take the form of acomputer program containing one or more sequences of machine-readableinstructions describing a method as disclosed above, or a data storagemedium (e.g. semiconductor memory, magnetic or optical disk) having sucha computer program stored therein.

One or more embodiments of the invention may be applied to any immersionlithography apparatus, in particular, but not exclusively, those typesmentioned above and whether the immersion liquid is provided in the formof a bath or only on a localized surface area of the substrate. A liquidsupply system as contemplated herein should be broadly construed. Incertain embodiments, it may be a mechanism or combination of structuresthat provides a liquid to a space between the projection system and thesubstrate and/or substrate table. It may comprise a combination of oneor more structures, one or more liquid inlets, one or more gas inlets,one or more gas outlets, and/or one or more liquid outlets that provideliquid to the space. In an embodiment, a surface of the space may be aportion of the substrate and/or substrate table, or a surface of thespace may completely cover a surface of the substrate and/or substratetable, or the space may envelop the substrate and/or substrate table.The liquid supply system may optionally further include one or moreelements to control the position, quantity, quality, shape, flow rate orany other features of the liquid. The descriptions above are intended tobe illustrative, not limiting. Thus, it will be apparent to one skilledin the art that modifications may be made to the invention as describedwithout departing from the scope of the claims set out below.

The invention claimed is:
 1. A lithographic apparatus comprising: amovable table; a projection system configured to project a radiationbeam toward the table, the projection system having an optical axispassing through a space between the projection system and the table; anda liquid confinement structure system configured to at least partlyconfine a liquid to within the space, the liquid confinement structuresystem comprising: a body having a portion protruding therefrom, theportion having a substantially horizontal upper surface, and a structurehaving a substantially horizontal lower surface extending above andacross the substantially horizontal upper surface of the portion, theupper and lower surfaces defining a flow channel therebetween to allow agenerally horizontal outward flow of liquid relative to the axis and thestructure defining at least in part an inlet opening arrangement toprovide liquid to the space, the inlet opening arrangement arranged soas to provide liquid toward the axis from opposite sides of the axis. 2.The lithographic apparatus of claim 1, further comprising an outlet at abottom surface of the liquid confinement structure system, the outletconfigured to extract a liquid filling at least partly a space betweenthe bottom surface of the liquid confinement structure system and thetable.
 3. The lithographic apparatus of claim 1, wherein the portion andstructure respectively define an aperture to allow transmission of theradiation beam and of liquid.
 4. The lithographic apparatus of claim 3,wherein an outlet of the flow channel surrounds the aperture.
 5. Thelithographic apparatus of claim 4, wherein an edge of the structure atthe aperture is beveled.
 6. The lithographic apparatus of claim 1,wherein the body is movable relative to the substrate.
 7. Thelithographic apparatus of claim 1, wherein a bottom surface of theportion forms part of a bottom surface of the liquid confinementstructure system.
 8. A lithographic apparatus comprising: a movabletable; a projection system configured to project a radiation beam towardthe table, the projection system having an optical axis passing througha space between the projection system and the table; and a liquidconfinement structure system configured to at least partly confine aliquid to within the space, the liquid confinement structure systemcomprising a structure defining an aperture through which the beampasses toward the substrate, the liquid confinement structure systemcomprising: a flow channel, located above the aperture, to allow agenerally horizontal outward flow of liquid relative to the axis, and aninlet opening arrangement, located above the flow channel, to provideliquid to the space, the inlet opening arrangement configured so as toprovide a generally horizontal inward flow of liquid relative to andtoward the axis from opposite sides of the axis.
 9. The lithographicapparatus of claim 8, further comprising an outlet at a bottom surfaceof the liquid confinement structure system, the outlet configured toextract a liquid filling at least partly a space between the bottomsurface of the liquid confinement structure system and the table. 10.The lithographic apparatus of claim 8, wherein an outlet of the flowchannel surrounds the aperture.
 11. The lithographic apparatus of claim8, wherein the structure is movable relative to the substrate.
 12. Thelithographic apparatus of claim 8, wherein the structure comprises aportion protruding from a body of the liquid confinement structuresystem, the flow channel at least partly defined by the portion.
 13. Thelithographic apparatus of claim 8, wherein an edge of the structure atthe aperture is beveled.
 14. A lithographic apparatus comprising: amovable table; a projection system configured to project a radiationbeam toward the table, the projection system having an optical axispassing through a space between the projection system and the table; anda liquid confinement structure system configured to at least partlyconfine a liquid to within the space, the liquid confinement structuresystem comprising: a first protruding structure defining at least inpart a flow channel to allow a generally horizontal outward flow ofliquid relative to the axis, and a second protruding structure, locatedabove the first protruding structure, defining at least in part an inletarrangement configured to provide a generally horizontal inward flow ofliquid relative to and toward the axis from opposite sides of the axis.15. The lithographic apparatus of claim 14, further comprising an outletat a bottom surface of the liquid confinement structure system, theoutlet configured to extract a liquid filling at least partly a spacebetween the bottom surface of the liquid confinement structure systemand the table.
 16. The lithographic apparatus of claim 14, wherein anoutlet of the flow channel surrounds the axis.
 17. The lithographicapparatus of claim 14, wherein at least the first protruding structureis movable relative to the substrate.
 18. The lithographic apparatus ofclaim 14, wherein an edge of the first protruding structure and/orsecond protruding structure at an aperture defined by the respectivefirst protruding structure and/or second protruding structure isbeveled.
 19. The lithographic apparatus of claim 14, wherein at leastpart of the first protruding structure is the form of a plate withessentially parallel upper and lower surfaces, wherein the upper surfacedefines at least in part the flow channel.
 20. The lithographicapparatus of claim 14, wherein a bottom surface of the first protrudingstructure forms part of a bottom surface of the liquid confinementstructure system.